Researchers in Institute of Materials Research and Engineering in Singapore have managed to create a series of high-resolution color 100,000 DPI images. This is the next generation of photography.
To achieve this print resolutions, the researchers used electro-beam lithography to cover a silicon wafer with pillars made from an insulating material. After that they deposited the nanodiscs on top and coated the surface of the wafer with metal to reflect the coloured light and make the image brighter.
Potential uses may include nanoscale watermarks and cryptography.